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Tokyo Electron Tel batch furnace TELFORMULA
Specification
	
 
	
 
	Tokyo Electron Tel batch furnace TELFORMULA
TELFORMULA is the semiconductor industry’s most advanced iso-thermal minibatch platform. TELFORMULA™ incorporates a number of innovative technologies specifically developed to address the industry’s need for a 300mm high speed batch platform capable of delivering short TAT (Turn Around Time) both suitable for product development and simultaneously capable of meeting demanding, high-volume production requirements. The short TAT is achieved by the convergence of multiple new core technologies, such as a metal-free fast ramping heater, low thermal mass chamber, rapid gas volume purge/displacement and a high speed wafer handling unit. The all quartz reactor concept provides the ideal processing environment for attaining the ultimate level of cleanness which is maintained by in-situ chamber dry gas cleaning reducing maintenance downtime and related costs. TELFORMULA™ is the ideal platform for a wide variety of semiconductor processes including LPCVD Si (Poly, a-Si), Si3N4, SiO2, ALD High-k, ATM/LP Oxidation, Oxynitridation, etc.
	 
	 
						Item 
					 
						TELINDY PLUS 
					 
						TELFORMULA 
					 
						TELINDY 
					 
						ALPHA-8S 
					 
						Wafer size (mm) 
					 
						300 
					 
						300 
					 
						300 
					 
						150,200 
					 
						Availability 
					 
						New, Certified used 
					 
						Certified used 
					 
						Certified used 
					 
						Certified used 
					 
						Production load max 
					 
						-125 
					 
						-50 
					 
						-125 
					 
						-150 
					 
						Cassette stocker 
					 
						-18 
					 
						-10 
					 
						-16 
					 
						-21 
					 
						Process 
					 
						Thermal ALD, LPCVD, 
						Oxide, Anneal, Nitride, 
						Oxide, Anneal, Nitride, 
						Oxide, Anneal, Nitride, 
						Reactor 
					 
						Thermal 
					 
						Thermal 
					 
						Thermal/Plasma 
					 
						Thermal 
					 
						Reactor 
					 
						Thermal 
					 
						Thermal 
					 
						Thermal/Plasma 
					 
						Thermal 
					 
						Process temp 
					 
						RT-1100C 
					 
						RT-1000C 
					 
						RT-1100C 
					 
						RT-1250C 
					 
						Additional features, Option 
					 
						N2/LL 
						N2/LL 
						N2/LL 
						N2/LL, Gas cleaning:
		
			
Keywords: 
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
			
					 
				
					 
				
Oxididation/Anneal 
					
					 
				
Poly, TEOS, High-k 
					
					 
				
Poly, TEOS, HTO, High-k 
					
					 
			
Poly, TEOS, HTO 
					
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
			
					 
				
					 
				
					 
				
					 
				
					 
			
				 
		
	
					 
				
					 
				
Gas cleaning 
					
					 
				
Gas cleaning 
					
					 
				
Gas cleaning
Advance platform 
					
					 
			
CIF3 for poly 
					
AOI Machine, Panasonic AOI Machine, SMT AOI Machine,PCB AOI Machine




Contact: Mr Tommy
Phone: +86 13691605420
Tel: +86 -755-85225569
Email: tommy@flason-smt.com
Add: 94#,Guangtian Road,Songgang Street,Bao an District Shenzhen China